Ion Implantation: Science and Technology (2010)

Ion Implantation: Science and Technology (2010)A Textbook about Ion Implantation in the Semiconductor Industry (Click on "Preview" below for extended details). The textbook covers both traditional ion implantation and also the current science problems and applications in CMOS technology. The chapters of the book include: History of Integrated Circuits & Ion Implantation Ion Implantation and Current and Future CMOS ICs Shallow Junctions Problems and Solutions Current Trends in Ion Implanters

A Textbook about Ion Implantation in the Semiconductor Industry (Click on "Preview" below for extended details).

The textbook covers both traditional ion implantation and also the current science problems and applications in CMOS technology. The chapters of the book include:
-History of Integrated Circuits & Ion Implantation
-Ion Implantation and Current and Future CMOS ICs
-Shallow Junctions Ð Problems and Solutions
-Current Trends in Ion Implanters
-Metrology of Ion Implantation
-Radiation Damage of Silicon

-Annealing of Radiation Damage in Silicon
-SOI Wafers Ð Current & Future Directions
-Development of Cluster Beam Technology
-Ion Implanter Concepts
-Source Physics and Maintenance
-End Station Problems Ð Dosimetry, Contamination, Charging and Cooling
-Safety in Ion Implantation
-New Directions in Ion Implantation & Plasma Doping
-Shallow Junctions (Cluster beams, TED Inhibitors, SOI)
-Non-Silicon Semiconductors with SOI Wafers